ALBANY — For months now, scientists and researchers on the campus of Albany NanoTech have been awaiting the arrival of a $400 million lithography system used to etch atomic-scale features onto silicon wafers.
That day has come.
On Tuesday, Gov. Kathy Hochul’s office announced that the first components of ASML’s TWINSCAN EXE: 5200 have begun arriving in Albany for installation in NanoFab Reflection, the new $600 million building at Albany NanoTech built specifically to hold the EXE: 5200, the centerpiece semiconductor manufacturing equipment at what’s being called the High NA EUV Lithography Center…